Key Advantages

SiFusion polysilicon furnaceware offers key advantages for different wafer manufacturing processes

High Temperature Processes

SiFusion furnaceware performs without deformities in demanding processes reaching temperatures up to 1350°C.

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LPCVD Processes

SiFusion’s products generate essentially no particles and reduce costly routine cleaning and associated hazardous wastes.

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Additional Processes

SiFusion is also ideal for other thermal operations, including the amorphous silicon process.

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